Deposition of WNxCy thin films for diffusion barrier application using the dimethylhydrazido (2−) tungsten complex (CH3CN)Cl4W(NNMe2)

نویسندگان

  • Hiral M. Ajmera
  • Timothy J. Anderson
  • Jürgen Koller
  • Lisa McElwee-White
  • David P. Norton
چکیده

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Synthesis and characterization of diorganohydrazido(2-) tungsten complexes.

Diorganohydrazido(2-) complexes of tungsten (L)Cl4W(NNR2) [R2=Me2, Ph2, -(CH2)5-; L=CH3CN, pyridine] were synthesized by reacting the corresponding 1,1-diorganohydrazine with WCl6, followed by reaction with acetonitrile or pyridine. Crystallographic structure determination of (CH3CN)Cl4W(NNMe2) and (CH3CN)Cl4W(NNPh2) allows a comparison of the structural features of the diorganohydrazido(2-) fu...

متن کامل

Chemical vapor deposition of WNxCy using the tungsten piperidylhydrazido complex Cl4„CH3CN...W„N-pip...: Deposition, characterization, and diffusion barrier evaluation

The tungsten piperidylhydrazido complex Cl4 CH3CN W N-pip 1 was used for film growth of tungsten carbonitride WNxCy by metal-organic chemical vapor deposition CVD in the absence and presence of ammonia NH3 in H2 carrier. The microstructure of films deposited with NH3 was x-ray amorphous between 300 and 450 °C. The chemical composition of films deposited with NH3 exhibited increased N levels and...

متن کامل

Deposition of WNxCy from the Tungsten Piperidylhydrazido Complex Cl4(CH3CN)W(N-pip) as a Single-Source Precursor

The tungsten piperidylhydrazido complex Cl4(CH3CN)W(N-pip) (1) was used as a single-source precursor for growth of tungsten carbonitride (WNxCy) by metal-organic chemical vapor deposition (CVD) in H2 carrier. Multiple spectroscopic techniques were used for preliminary evaluation of the suitability of 1 as a precursor and to suggest possible fragmentation pathways. The effect of growth temperatu...

متن کامل

Effect of NH3 on Film Properties of MOCVD Tungsten Nitride from Cl4„CH3CN...W„N iPr..

Thin films of tungsten nitride were deposited from Cl4(CH3CN!W~N Pr) by metallorganic chemical vapor deposition ~MOCVD! in the presence and absence of ammonia (NH3) coreactant. Films were analyzed by X-ray diffraction, Auger electron spectroscopy, and X-ray photoelectron spectroscopy ~XPS!. Films grown with NH3 had increased nitrogen levels and decreased carbon and oxygen levels relative to fil...

متن کامل

Designing and Fabrication of Electrochromic Windows Using Tungsten Oxide Films Prepared Through Sol-gel Coating on a Glass

In this study, a sol-gel peroxotungstic acid sol was employed to deposit tungsten oxide (WO3) films by the spin-coating technique. In view of smart window applications, electrochromic windows were then designed and fabricated using a thin tungsten oxide film. For this purpose, Glass/ FTO/ WO3/ electrolyte/ FTO/Glass could be of use due to its special structure that consists of an electrochromic...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2009